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UHV deposition system EBEAM-SPUTTER Diesel Generator
- Listing No
- 891056
- Year
- Manufacturer
- UHV
- Model
- EBEAM-SPUTTER
- Condition
- Used
- Location
- Netherlands
- Price
- POA
- Description
- UHV deposition system (ebeam sputter) UHV deposition system: Was used for deposition Titanium - Gold (ebeam) Ebeam deposition unit is removed Cryopump and prepump is removed Loadlock: for samples round 75mm Incl. sample heater 450l/s turbomolecular pump (Leybold) Proceschamber: Size: Width 680mm x Height 750mm x Depth 590mm Incl. shielding Double oring door (partially pumped) Heaters Basepressure low 10-7mbar, high 10-8mbar Electronics: Baseline cabinet (e-beam unit removed) Old PLC (for pump/vent) Gas cabinet/water: Various valves/flow reducers for gas and water Note: D&M Vacuumsystems can upgrade the system to new processes (E-beam or Sputter) incl. new electronics and software. Comqtwouhcn Nomgori EUR 55.000,- The listing was translated automatically. Translation errors are possible. Request more information Request more information Already requested
About this machine
UHV deposition system EBEAM-SPUTTER Diesel Generator
This is a used ultra-high-vacuum (UHV) deposition system manufactured by UHV, designed for thin-film coating and material deposition applications. The system was previously configured for electron beam (e-beam) deposition of metals including titanium and gold. Such equipment is essential in semiconductor manufacturing, materials research, optics, and advanced coating industries where precise vacuum conditions and controlled material deposition are required.
The system comprises three main functional sections. The loadlock chamber accommodates round samples up to 75 mm in diameter and includes an integrated sample heater for temperature-controlled processing. It is equipped with a 450 litre per second turbomolecular pump manufactured by Leybold and supporting prepump infrastructure, enabling rapid sample exchange without compromising chamber vacuum.
The process chamber measures 680 mm in width, 750 mm in height, and 590 mm in depth. It features internal shielding, a double O-ring door design with partial pumping capability, and integrated heater elements. The chamber achieves base pressures of 10⁻⁷ millibar under standard operation and 10⁻⁸ millibar under optimised conditions, meeting stringent UHV requirements for contamination-free deposition.
The electronics cabinet contains baseline control infrastructure; the original e-beam deposition unit has been removed. A legacy programmable logic controller (PLC) manages pump and venting functions. The gas and water supply cabinet includes various flow control valves and reducers to support process gas delivery and thermal management.
Note that the e-beam deposition unit, cryopump, and prepump have been removed from this system. The vendor D&M Vacuumsystems offers retrofit and upgrade services to restore or reconfigure the system with contemporary e-beam or sputter deposition processes, including new control electronics and software.
This description was generated automatically from the listing details and may not reflect every specification. Please confirm with the seller before purchase.
